Browsing by Author "Mu, Haoran"
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Item Fraxicon for Optical Applications with Aperture ∼1 mm: Characterisation Study(2023) Mu, Haoran; Smith, Daniel; Ng, Soon Hock; Anand, Vijayakumar; Le, Nguyen Hoai An; Dharmavarapu, Raghu; Khajehsaeidimahabadi, Zahra; Richardson, Rachael T.; Ruther, Patrick; Stoddart, Paul R.; Gricius, Henrikas; Baravykas, Tomas; Gailevicius, Darius; Seniutinas, Gediminas; Katkus, Tomas; Juodkazis, SauliusEmerging applications of optical technologies are driving the development of miniaturised light sources, which in turn require the fabrication of matching micro-optical elements with sub-1 mm cross-sections and high optical quality. This is particularly challenging for spatially constrained biomedical applications where reduced dimensionality is required, such as endoscopy, optogenetics, or optical implants. Planarisation of a lens by the Fresnel lens approach was adapted for a conical lens (axicon) and was made by direct femtosecond 780 nm/100 fs laser writing in the SZ2080™ polymer with a photo-initiator. Optical characterisation of the positive and negative fraxicons is presented. Numerical modelling of fraxicon optical performance under illumination by incoherent and spatially extended light sources is compared with the ideal case of plane-wave illumination. Considering the potential for rapid replication in soft polymers and resists, this approach holds great promise for the most demanding technological applications.Item Si-Cr Nano-Alloys Fabricated by Direct Femtosecond Laser Writing(2023) Maksimovic, Jovan; Mu, Haoran; Han, Molong; Smith, Daniel; Katkus, Tomas; Anand, Vijayakumar; Nishijima, Yoshiaki; Hock Ng, Soon; Juodkazis, SauliusUltra-short 230 fs laser pulses of 515 nm wavelength were tightly focused into 700 nm focal spots and utilised in opening ∼400 nm nano-holes in a Cr etch mask that was tens-of-nm thick. The ablation threshold was found to be 2.3 nJ/pulse, double that of plain silicon. Nano-holes irradiated with pulse energies below this threshold produced nano-disks, while higher energies produced nano-rings. Both these structures were not removed by either Cr or Si etch solutions. Subtle sub-1 nJ pulse energy control was harnessed to pattern large surface areas with controlled nano-alloying of Si and Cr. This work demonstrates vacuum-free large area patterning of nanolayers by alloying them at distinct locations with sub-diffraction resolution. Such metal masks with nano-hole opening can be used for formation of random patterns of nano-needles with sub-100 nm separation when applied to dry etching of Si.Item THz Filters Made by Laser Ablation of Stainless Steel and Kapton Film(2022) Han, Molong; Smith, Daniel; Hock Ng, Soon; Vilagosh, Zoltan; Anand, Vijayakumar; Katkus, Tomas; Reklaitis, Ignas; Mu, Haoran; Ryu, Meguya; Morikawa, Junko; Vongsvivut, Jitraporn; Appadoo, Dominique; Juodkazis, SauliusTHz band-pass filters were fabricated by femtosecond-laser ablation of 25-μm-thick micro-foils of stainless steel and Kapton film, which were subsequently metal coated with a ∼70 nm film, closely matching the skin depth at the used THz spectral window. Their spectral performance was tested in transmission and reflection modes at the Australian Synchrotron’s THz beamline. A 25-μm-thick Kapton film performed as a Fabry–Pérot etalon with a free spectral range (FSR) of 119 cm−1, high finesse Fc≈17, and was tuneable over ∼10μm (at ∼5 THz band) with β=30∘ tilt. The structure of the THz beam focal region as extracted by the first mirror (slit) showed a complex dependence of polarisation, wavelength and position across the beam. This is important for polarisation-sensitive measurements (in both transmission and reflection) and requires normalisation at each orientation of linear polarisation.