Atomic layer deposition of artificially structured dielectric materials

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dc.contributor.authorKukli, Kaupo
dc.date.accessioned2014-09-18T10:44:16Z
dc.date.available2014-09-18T10:44:16Z
dc.date.issued1999
dc.description.urihttps://www.ester.ee/record=b1164468*estet
dc.identifier.isbn9789949376438
dc.identifier.otherDiss.A-2325
dc.identifier.urihttp://hdl.handle.net/10062/43525
dc.language.isoenet
dc.publisherTartu : Tartu University Presset
dc.relation.ispartofseriesDissertationes physicae Universitatis Tartuensis, 1406-0647;27
dc.subjectoksiidkiledet
dc.subjectaatomkihtsadestamineet
dc.subjectfüüsikalised omadusedet
dc.subjectdissertatsioonidet
dc.titleAtomic layer deposition of artificially structured dielectric materialset
dc.typeThesiset

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